TFT LCD Manufacturing Process Part Two

TFT:

·        Deposit semiconductor material and ITO in designed order on glass substrate.

·        Photoresist coating.

·        Partial exposure, then clean the exposed photoresist.

·        Tear off the semiconductor and ITO without the cover of photoresist to form part of the circuit.

·        Clean the remain photoresist.

·        To build the whole circuit, we often need to repeat the steps for 5 times.

CF:

·        Create a black matrix on the glass substrate as the boundary using PR method.

·        Coat red, green and blue material within black matrix separately using PR method.

·        Coat a overcover on RGB (red, green and blue) layer.

·        Deposit ITO circuit.

2. Cell

In this step we’re going to assemble the TFT and CF glass and fill in LC at the same time.

·        Coat polyimide film, using to constrain the initial direction of LC molecule, on the ITO side of both TFT and CF glass.

·        Use glue to build a boundary for LC on both glass. And on CF glass, apply one more layer of  conductive adhesive. This enable LC molecule link to the control circuit.

·        Fill LC within the boundary.

·        Stick two glass together, then cut the large glass into small pieces in line with standard.

Attach polarizer film on the both side of the incised glass